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Equipment
Equipment
Thin Film Preparation
- High vacuum magnetron sputter apparatus for large area coatings
- High vacuum magnetron sputter facility for multilayers from triple-2" targets
- High vacuum e-beam and thermal evaporation apparatus + sputtering
- Photolithography (micrometer structures), Thin film profilometer
Bulk Sample Preparation
- Preparation unit for toxic powders; cold press apparatus; LN2- ball mill
- Silica-capsule sealing with turbo-pump
Furnace Laboratory
- Annealing and melting furnaces (> 2000°C) under protective gas up to 1550°C
- Arc furnace
- Flash furnace (Rapid Thermal Annealing)
- Levitation melting furnace
- Special joining furnaces
Thermal Analysis
- MHTC calorimeter, DSC heat-flux 450°C -1600°C and RT -1400°C, drop calorimeter < 1300°C
- DTA/TG in simultaneous apparatus
- DTA up to 1550°C, with DSC-plate-sensor up to 1400°C
Phase- and Microstructural Analysis
- Scanning electron microscope with EDX light element analysis (>boron), WDX and digital image processing
- X-ray diffractometer with position sensitive detector and optional high temperature chamber (up to 1400°C)
and/or glancing angle measurement device
- Metallography, optical microscopy, chemical lab
Electrical Contact Characterization
- Contact prober for microcontacts to semiconductors at controlled temperature
- I-V source-measure unit
- C-V analyzer unit
Thermodynamic Computer Modeling
- Software packages and databases for thermodynamic and phase diagram calculations in multicomponent systems, such as:
- Pandat
- ChemSage
- Adamis
- LUKAS programs
- Thermocalc
- TerQuat
- FactSage